Self-bias voltage formation and charged particle dynamics in multi-frequency capacitively coupled plasmas

  • In this work, we analyze the creation of the discharge asymmetry and the concomitant formation of the DC self-bias voltage in capacitively coupled radio frequency plasmas driven by multi-frequency waveforms as a function of the electrode surface characteristics. For the latter, we consider and vary the coefficients that characterize the elastic reflection of electrons from the surfaces and the ion-induced secondary electron yield. Our investigations are based on particle-in-cell/Monte Carlo collision simulations of the plasma and on a model that aids the understanding of the computational results. Electron reflection from the electrodes is found to slightly affect the discharge asymmetry in the presence of multi-frequency excitation, whereas secondary electrons cause distinct changes to the asymmetry of the plasma as a function of the phase angle between the harmonics of the driving voltage waveform and as a function the number of these harmonics.

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Metadaten
Author:Ranna U. MasheyevaORCiDGND, Karlygash N. DzhumagulovaORCiDGND, Murat MyrzalyORCiDGND, Julian SchulzeORCiDGND, Zóltán DonkóORCiDGND
URN:urn:nbn:de:hbz:294-87970
DOI:https://doi.org/10.1063/5.0055444
Parent Title (English):AIP advances
Publisher:AIP Publishing LLC.
Place of publication:College Park
Document Type:Article
Language:English
Date of Publication (online):2022/03/30
Date of first Publication:2021/07/22
Publishing Institution:Ruhr-Universität Bochum, Universitätsbibliothek
Tag:Open Access Fonds
Volume:11
Issue:7, Artikel 075024
First Page:075024-1
Last Page:075024-14
Note:
Article Processing Charge funded by the Open Access Publication Fund of Ruhr-Universität Bochum.
Institutes/Facilities:Institut für Experimentalphysik V, Lehrstuhl für Plasma- und Atomphysik
Dewey Decimal Classification:Technik, Medizin, angewandte Wissenschaften / Elektrotechnik, Elektronik
open_access (DINI-Set):open_access
faculties:Fakultät für Elektrotechnik und Informationstechnik
Licence (English):License LogoCreative Commons - CC BY 4.0 - Attribution 4.0 International